Pengaruh Tekanan Chamber terhadap Deposisi Carbon Nanotube (CNT) Berbasis Katalis Ni dengan Metode HWC in plasma-VHF-PECVD

Ajeng Eliyana; Rustan Ruslan; Deska Lismawenning Puspitarum; Harlina Ardiyanti; Nadiisah Nurul Inaayah; Fatimah Arofiati Noor; Toto Winata

doi:10.17509/wafi.v11i1.826

Authors

Ajeng Eliyana Program Studi Fisika, Institut Teknologi Sumatera
Rustan Ruslan Departemen Fisika, Institut Teknologi Bandung
Deska Lismawenning Puspitarum Program Studi Fisika, Institut Teknologi Sumatera
Harlina Ardiyanti Program Studi Fisika, Institut Teknologi Sumatera
Nadiisah Nurul Inaayah Program Studi Fisika, Institut Teknologi Sumatera
Fatimah Arofiati Noor Program Studi Fisika, Institut Teknologi Sumatera
Toto Winata Program Studi Fisika, Institut Teknologi Sumatera

DOI:

https://doi.org/10.17509/wafi.v11i1.826

Keywords:

Evaporasi, HWC in plasma-VHF-PECVD, Carbon nanotube (CNT), Tekanan Chamber, Katalis Nikel (Ni)

Abstract

Penelitian ini mengkaji pengaruh tekanan chamber terhadap deposisi dan kualitas struktur Carbon Nanotube (CNT) yang disintesis menggunakan metode HWC in plasma-VHF-PECVD dengan katalis nikel (Ni). CNT dideposisi pada tekanan 300, 400, dan 500 mTorr dengan parameter tetap berupa laju alir CH₄ sebesar 80 sccm, suhu substrat 275 °C, daya RF 8 W, dan waktu deposisi 60 menit. Karakterisasi dilakukan menggunakan Scanning Electron Microscopy (SEM), spektroskopi Raman, dan X-ray Diffraction (XRD). Citra SEM menunjukkan terbentuknya CNT pada seluruh variasi tekanan dengan morfologi yang dipengaruhi oleh distribusi klaster katalis. Spektrum Raman memperlihatkan pita RBM, D, G, dan G’, dengan rasio I_D/I_G meningkat dari 1,14 menjadi 1,43 seiring kenaikan tekanan, yang mengindikasikan peningkatan densitas cacat. Diameter CNT yang dihitung dari mode RBM berada pada kisaran 2,68–3,00 nm dengan tren non-linear terhadap tekanan. Analisis XRD menunjukkan puncak lebar pada bidang (002) dan (100), yang mengindikasikan struktur grafitik yang masih didominasi fase amorf. Hasil menunjukkan bahwa tekanan 300 mTorr merupakan kondisi optimum untuk menghasilkan CNT dengan kualitas struktur yang lebih baik. Temuan ini memberikan pemahaman mengenai peran tekanan dalam mengontrol deposisi CNT, serta berpotensi mendukung pengembangan material CNT untuk aplikasi perangkat elektronik dan sel surya.

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